|
|
| |
| |
DEEP Clean S100 Dissolve Epi Exhaust
Polymer DEEP Clean S100 is a specialty
cleaning formulation designed for quick,
effective clean-up of silicon EPIi
deposition equipment.
S100 provides an effective alternative to HF
acid cleaning. Chamber, exhaust, and
scrubber components can be effectively
cleaned at normal maintenance cycles using
DEEP Clean S100. S100 is designed to be
non-gelling and low foaming for quick,
simple cleaning.
The formulation is designed to dissolve the
epi exhaust polymer that builds up between
maintenance cycles on silicon epi deposition
equipment. S100 is a proprietary blend
including fluorine salts, surfactants,
wetting agents, and reaction inhibitors.
|
|
Thank you for taking the time to visit the
CHEMICAL SOLUTIONS section of our website.
In this section you will find a complete
listing of our CHEMICAL SOLUTIONS
products.
 Click
Here To Request A Quote...
Need a budgetary quotation? Please
don't hesitate to contact G2. We
have never claimed to be the cheapest,
however our products are the most reliable
& accurate products on the market.
With a warranty like no other.
G2 Automated Technologies, LLC.
10500 Metric Dr Bldg 122
Dallas, Texas 75243
Toll-free: 1-866-6-G2ATEC
Phone: 972-479-0699
Fax: 972-479-0717
E-mail:
sales@g2automatedtechnologies.com
|
|
|
